OUR WORKS

LINE SURFACE TREATMENT

SURFACE TREATMENT

WORKS

We perform the processing in conformity with the SEMI International Standards
for fields of semiconductor.

A:surface roughness <0.13μmRa Ave、<0.25μmRa Max
B:surface discontinuity apply SEMI F71, Ave:15pieces  Max:25pieces
C:surface contamination apply F72
D:depth of the oxidation layer apply F72
Oxide Depth : ≧20Å
Carbon Layer: ≦10Å
Cr/Fe @10Å : ≧1.0
Detached FeO: None
E:Chromium content apply F60

Cr/Fe : ≧2.0
CrO/FeO : ≧3.0

MATERIAL

SUS (stainless steel) SUS316L semiconductor materials

OTHER OUR WORKS

  • 切削
    Lines Machining
  • 研削
    Lines Grinding
  • 研磨
    Lines Lapping and Polishing
  • 超精密加工
    Ultra Precision Processing
  • 測定
    Measuring System